New zinc compound could simplify manufacturing of thin-film semiconductors
Researchers have created a volatile zinc compound that breaks down predictably at low temperatures, making it ideal for vapor deposition of zinc sulfide films used in optics and electronics. The discovery could streamline production of thin-film semiconductors by eliminating the need for extreme heat or complex chemical processes.
Originaltitel: Synthesis, characterisation and reactivity of a zinc triazenide for potential use in vapour deposition
<p>In this study, we synthesised and characterised a new zinc(ii) triazenide for potential use in vapour deposition of zinc sulphide thin films. The compound is volatile and quantitatively sublimes at 80 degrees C under vacuum (0.5 mbar). Thermogravimetric analysis showed a one-step volatilisation with an onset temperature at similar to 125 degrees C and 5% residual mass. The compound also reacted with 2 or 4 molar equivalents of triphenylsilanethiol to give dimeric and monomeric zinc thiolates, respectively. The high volatility, thermal stability, and reactivity with sterically hindered thiols makes this compound a potential candidate for use in vapour deposition of zinc containing thin films. Herein, we synthesise and characterise a new volatile and thermally stable Zn(ii) triazenide. We also react it with a bulky thiol to give two different Zn(ii) thiolates. This new triazenide shows high promise as a precursor for vapour deposition of ZnS thin films.</p>